SIMS Microprobe for Isotopic and Trace Element Analysis at High Spatial Resolution

The NanoSIMS 50L is a unique ion microprobe optimizing SIMS analysis performance at high lateral resolution. It is based on a coaxial optical design of the ion beam and the secondary ion extraction, and on an original magnetic sector mass analyzer with multicollection.

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High Performance Low Energy SIMS for Advanced Semiconductor Applications

The IMS Wf and SC Ultra have been specifically designed to meet the increasing needs for dynamic SIMS measurements in advanced semiconductors. Offering a large range of impact energies (100 eV to 10 keV) with no compromise on mass resolution and primary beam density, they ensure unequalled analytical performance at high throughput for the most challenging applications: extra shallow & high energy implants, ultra-thin nitride oxides, high-k metal gates, SiGe doped layers, Si:C:P structures, PV & LED devices, graphene, etc…

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Versatile SIMS Tool: Reference Detection Sensitivity with High Throughput & Full Automation

The IMS 7f-Auto is the latest version of our successful IMS xf Secondary Ion Mass Spectrometer (SIMS) product line. Designed to deliver high precision elemental and isotopic analyses with increased ease-of-use and productivity, it has been optimized for challenging applications such as glass, metals, ceramics, Si-based, III-V and II-VI devices, bulk materials, thin films… fulfilling industry requirements for efficient device development and process control.

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Large Geometry Ion Microprobe for Geosciences

The IMS 1300-HR³ is a large geometry ion microprobe delivering unequalled analytical performance for a wide range of geoscience applications: tracking geological processes using stable isotopes, dating minerals, determining the presence and distribution of trace elements. Its high sensitivity and high lateral resolution also make it the tool of choice to search and measure uranium particles for nuclear safeguards purposes.

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Fully automated SIMS for compositional measurement in the semiconductor fab

The AKONIS SIMS tool fills a critical gap in semiconductor fabrication processes by providing high throughput, high precision detection for implant profiles, composition analysis and interfacial data directly in the semiconductor manufacturing line. AKONIS offers a very high level of automation to ensure repeatability across tools for fab level process control and tool-to-tool matching.

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Quadrupole SIMS Dopant Depth Profiling and Thin Layer Analysis in Semiconductors

The CAMECA SIMS 4550 offers extended capabilities for ultra shallow depth profiling, trace element and composition measurements of thin layers in Si, high-k, SiGe and other compound materials such as III-V for optical devices.

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Front-end semiconductor compositional metrology solution for 22nm node and beyond

CAMECA’s EX-300 is a unique LEXES based metrology tool supporting major semiconductor developments since the 90nm node era and following up the integration of the most diverse materials. It accelerates the time-to-market of your logic and memory devices and increases the integrated yield of your high volume production.

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The Electron Microprobe that brings EPMA to your fingertips

Since pioneering Electron Probe MicroAnalysis in the 1950’s CAMECA has released several generations of microprobes, all with a proven valuable track record for analytical performance and reliability. The new SXFive-TACTIS builds on this legacy to deliver enhanced imaging and quantitative analysis performance in a user-friendly environment.

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Shielded Electron Probe MicroAnalyzer for Radioactive Samples

SKAPHIA provides a safe environment for manipulating and analyzing nuclear samples together with benchmark analytical performance allowing scientists to gain a deeper understanding of fuel performance, to explore irradiated material behaviour and radiation damage processes, to develop innovative alloys and structural materials, to optimize the nuclear fuel cycle and to achieve better nuclear waste management…

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3D Atom Probe Microscope with unmatched 3D sub-nanometer analytical performance

The LEAP 5000 is CAMECA’s cutting-edge atom probe microscope, offering superior detection efficiency across a wide variety of metals, semiconductors and insulators: more than 40% extra atoms detected per nm3 analyzed.

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The Atom Probe that enables routine, high performance 3D nano-analysis for both research and industry

Building on 30 years of success in Atom Probe Tomography instrumentation and application, CAMECA has developed EIKOS™, the Atom Probe microscope for rapid alloy development and nanoscale materials research.

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